PHI VersaProbe II Scanning XPS Microprobe
The VersaProbe II is the next generation of PHI's highly successful Multi-Technique Scanning XPS Microprobe, which features a new software user interface for instrument operation and a new 128 channel detector. The VersaProbe II is based on PHI’s scanning x-ray microprobe technology, that provides high performance XPS large area spectroscopy, superior micro-area spectroscopy, chemical imaging, and secondary electron imaging with a raster scanned 10 µm diameter x-ray beam.
PHI’s innovative and patented dual beam charge neutralization method provides turn-key analysis of insulating samples using a combination of low energy ions and electrons.
The integral floating column argon ion gun provides an impressive sputter depth profiling capability for inorganic thin film structures. Optional C60+ and Ar2500+ cluster source ion guns provide a unique and powerful organic sputter depth profiling capability.