Taipan G2+ Circuit Edit System
Circuit edit system for advanced technology nodes.
Circuit edit technology provides rapid prototyping of small design corrections at various points in the intergrated circuit (IC) manufacturing process: after first silicon debug; for performance enhancements during yield ramp; to create a small number of functioning chips for beta developers; and to resolve reliability issues. Circuit edit engineers mill the chip to the site of the suspected defect, and then remove or deposit conductors or insulators in precise geometries-allowing IC manufacturers to validate design changes without re-spinning masks and processing additional wafers. To meet the stringent circuit edit requirements of the advanced technology nodes, the Thermo Scientific Taipan G2+ Circuit Edit system focused ion beam system was engineered to meet the challenges of advanced designs and processes. The coaxial ion-photon column, electronics, chamber and stage enable a highly controlled beam profile and current, accurate navigation and ion beam placement, and reliable end-pointing. An updated chemical delivery system provides industry-leading etch and deposition chemistries. | ||
Key features
Imaging and milling resolutionImaging and milling resolution to meet advanced technology node specifications. Selectivity and deposition controlExcellent etch selectivity and deposition control for conductors and insulators. | Navigation and ion beam placementOptimized stage design for fast navigation and ion beam placement accuracy to ensure high success rate on the most challenging edits. | |
For more details: https://www.thermofisher.com/tr/en/home/electron-microscopy/products/circuit-edit-systems/taipan-circuit-edit-system.html